Patent details

EP1354980 Title: Method for forming a porous SiOCH layer.

Basic Information

Publication number:
EP1354980
PCT Application Number:
Type:
European Patent Granted for LU
Legal Status:
Lapsed
Application number:
EP030087233
PCT Publication Number:
First applicant's nationality:
Translation Language:
EPO Publication Language:
English
English Title of Invention:
Method for forming a porous SiOCH layer.
French Title of Invention:
Procédé de production d'un film en SiOCH poreux
German Title of Invention:
Verfahren zur Herstellung einer porösen SiOCH-Schicht
SPC Number:

Dates

Filing date:
16/04/2003
Grant date:
23/02/2011
EP Publication Date:
23/02/2011
PCT Publication Date:
Claims Translation Received Date:
Translations Received Date (B1 EP Publication):
Translations Received Date (B2 EP Publication):
Translations Received Date (B3 EP Publication):
Publication date:
22/10/2003
EP B1 Publication Date:
23/02/2011
EP B2 Publication Date:
EP B3 Publication Date:
Lapsed date:
16/04/2011
Expiration date:
16/04/2023
Renunciation date:
Revocation date:
Annulment date:

Owner

From:
16/04/2003
 
 

Name:
AIR PRODUCTS AND CHEMICALS INC.
Address:
7201 Hamilton Boulevard, Allentown, PA 18195-1501, United States (US)

Inventor

1

Name:
Xiao Manchao
Address:
United States (US)

2

Name:
Vincent Jean Louise
Address:
United States (US)

3

Name:
Norman John Anthony Thomas
Address:
United States (US)

4

Name:
Vrtis Raymond Nicholas
Address:
United States (US)

5

Name:
Lukas Aaron Scott
Address:
United States (US)

6

Name:
O'Neill Mark Leonard
Address:
United States (US)

Priority

1

Priority Number:
373104 P
Priority Date:
17/04/2002
Priority Country:
United States (US)

2

Priority Number:
150798
Priority Date:
17/05/2002
Priority Country:
United States (US)

3

Priority Number:
409468
Priority Date:
07/04/2003
Priority Country:
United States (US)

Classification

Main IPC Class:
C23C 16/40;
Filing date Document type Number of pages