Patent details

Basic Information

Publication number:

EP2599892

PCT Application Number:

JP2011067061

Type:

European Patent Granted for LU

Legal Status:

Lapsed

Application number:

EP118125103

PCT Publication Number:

WO2012014921

First applicant's nationality:

Translation Language:

EPO Publication Language:

English

English Title of Invention:

SPUTTERING TARGET AND/OR COIL AND PROCESS FOR PRODUCING SAME

French Title of Invention:

CIBLE ET/OU BOBINE DE PULVÉRISATION CATHODIQUE, ET LEUR PROCÉDÉ DE FABRICATION

German Title of Invention:

SPUTTERTARGET UND/ODER SPULE SOWIE HERSTELLUNGSVERFAHREN DAFÜR

SPC Number:

Dates

Filing date:

27/07/2011

Grant date:

14/10/2020

EP Publication Date:

05/06/2013

PCT Publication Date:

02/02/2012

Claims Translation Received Date:

Translations Received Date (B1 EP Publication):

Translations Received Date (B2 EP Publication):

Translations Received Date (B3 EP Publication):

Publication date:

14/10/2020

EP B1 Publication Date:

14/10/2020

EP B2 Publication Date:

EP B3 Publication Date:

Lapsed date:

27/07/2021

Expiration date:

27/07/2031

Renunciation date:

Revocation date:

Annulment date:

Owner

From:

07/10/2020

 

 

Name:

JX Nippon Mining & Metals Corporation

Address:

10-4, Toranomon 2-chome Minato-ku, Tokyo 105-8417, Japan (JP)

Inventor

1

Name:

NAGATA Kenichi

Address:

Japan (JP)

2

Name:

MAKINO Nobuhito

Address:

Japan (JP)

Priority

Priority Number:

2010172408

Priority Date:

30/07/2010

Priority Country:

Japan (JP)

Classification

IPC classification:

C21D 1/74; C21D 3/06; C22C 14/00; C22C 27/02; C22F 1/00; C22F 1/18; C23C 14/34; H01J 37/34;

Publication

European Patent Bulletin

Issue number:

202042

Publication date:

14/10/2020

Description:

Grant (B1)

Annual Fees

Annual Fee Due Date:

Annual Fee Number:

Expected Payer:

Last Annual Fee Payment Date:

Last Annual Fee Paid Number:

Payer:

Filing date	Document type	Number of pages