Patent details
EP2666057 Title: CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
Basic Information
- Publication number:
- EP2666057
- PCT Application Number:
- JP2011080549
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP118564210
- PCT Publication Number:
- WO2012098822
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
- French Title of Invention:
- COMPOSITION DE RÉSERVE À AMPLIFICATION CHIMIQUE, COUCHE DE RÉSERVE UTILISANT LA COMPOSITION, ÉBAUCHES DE MASQUE RECOUVERTES DE RÉSINE, PROCÉDÉ DE FORMATION DE MOTIF DE RÉSERVE, PHOTOMASQUE ET COMPOSÉ POLYMÈRE
- German Title of Invention:
- CHEMISCH VERSTÄRKTE LACKZUSAMMENSETZUNG, LACKFILM MIT DER ZUSAMMENSETZUNG, LACKBESCHICHTETE MASKENROHLINGE, VERFAHREN ZUR FORMUNG EINER LACKSTRUKTUR, FOTOMASKE UND POLYMERVERBINDUNG
- SPC Number:
Dates
- Filing date:
- 22/12/2011
- Grant date:
- 28/07/2021
- EP Publication Date:
- 27/11/2013
- PCT Publication Date:
- 26/07/2012
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 28/07/2021
- EP B1 Publication Date:
- 28/07/2021
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 22/12/2021
- Expiration date:
- 22/12/2031
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 21/07/2021
- Name:
- FUJIFILM Corporation
- Address:
- 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 106-8620, Japan (JP)
Inventor
1
- Name:
- YATSUO, Tadateru
- Address:
- Japan (JP)
2
- Name:
- TSUCHIMURA, Tomotaka
- Address:
- Japan (JP)
Priority
1
- Priority Number:
- 2011008331
- Priority Date:
- 18/01/2011
- Priority Country:
- Japan (JP)
2
- Priority Number:
- 201161504431 P
- Priority Date:
- 05/07/2011
- Priority Country:
- United States (US)
3
- Priority Number:
- 2011255302
- Priority Date:
- 22/11/2011
- Priority Country:
- Japan (JP)
Classification
- IPC classification:
- G03F 7/038; C08F 12/24; G03F 7/039;
Publication
European Patent Bulletin
- Issue number:
- 202130
- Publication date:
- 28/07/2021
- Description:
- Grant (B1)
Annual Fees
- Annual Fee Due Date:
- Annual Fee Number:
- Expected Payer:
- Last Annual Fee Payment Date:
- Last Annual Fee Paid Number:
- Payer:
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