Patent details
EP3997521 Title: PHOTORESIST REMOVER COMPOSITIONS
Basic Information
- Publication number:
- EP3997521
- PCT Application Number:
- EP2020069326
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP207405614
- PCT Publication Number:
- WO2021005140
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- PHOTORESIST REMOVER COMPOSITIONS
- French Title of Invention:
- COMPOSITIONS DE DÉCAPAGE DE RÉSINE PHOTOSENSIBLE
- German Title of Invention:
- PHOTOLACKENTFERNERZUSAMMENSETZUNGEN
- SPC Number:
Dates
- Filing date:
- 09/07/2020
- Grant date:
- 30/08/2023
- EP Publication Date:
- 18/05/2022
- PCT Publication Date:
- 14/01/2021
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 30/08/2023
- EP B1 Publication Date:
- 30/08/2023
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 09/07/2024
- Expiration date:
- 09/07/2040
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 23/08/2023
- Name:
- Merck Patent GmbH
- Address:
- Frankfurter Strasse 250, 64293 Darmstadt, Germany (DE)
Inventor
1
- Name:
- ARENT, Robert
- Address:
- United States (US)
2
- Name:
- WU, Hengpeng
- Address:
- United States (US)
Priority
- Priority Number:
- 201962872950 P
- Priority Date:
- 11/07/2019
- Priority Country:
- United States (US)
Classification
- IPC classification:
- G03F 7/42;
Publication
European Patent Bulletin
- Issue number:
- 202335
- Publication date:
- 30/08/2023
- Description:
- Grant (B1)
Annual Fees
- Annual Fee Due Date:
- Annual Fee Number:
- Expected Payer:
- Last Annual Fee Payment Date:
- Last Annual Fee Paid Number:
- Payer:
| Filing date | Document type | Number of pages |
|---|