Patent details
EP1044074 Title: PHOTORESIST COATING PROCESS CONTROL WITH SOLVENT VAPOR SENSOR
Basic Information
- Publication number:
- EP1044074
- PCT Application Number:
- PCT/US/1998/026143
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP989670922
- PCT Publication Number:
- WO/1999/029439
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- PHOTORESIST COATING PROCESS CONTROL WITH SOLVENT VAPOR SENSOR
- French Title of Invention:
- COMMANDE DE PROCESSUS D'APPLICATION DE PHOTORESIST A DETECTEUR DE VAPEUR DE SOLVANT
- German Title of Invention:
- VERFAHRENSREGELUNG FÜR PHOTORESISTENTE BESCHICHTUNG MIT SOLVENTDAMPFSENSOR
- SPC Number:
Dates
- Filing date:
- 08/12/1998
- Grant date:
- 20/06/2007
- EP Publication Date:
- 20/06/2007
- PCT Publication Date:
- 17/06/1999
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 18/10/2000
- EP B1 Publication Date:
- 20/06/2007
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 08/12/2007
- Expiration date:
- 08/12/2018
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 07/06/2007
- Name:
- ASML Holding N.V.
- Address:
- De Run 6501, 5504 DR Veldhoven, Netherlands (NL)
Inventor
1
- Name:
- Savage Richard
- Address:
- United States (US)
2
- Name:
- Litvak Herbert
- Address:
- United States (US)
3
- Name:
- Gurer Emir
- Address:
- United States (US)
Priority
- Priority Number:
- 987179
- Priority Date:
- 08/12/1997
- Priority Country:
- United States (US)
Classification
- Main IPC Class:
- B05D 3/12;
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