Patent details
EP1561239 Title: ATOMIC LAYER DEPOSITION METHODS
Basic Information
- Publication number:
- EP1561239
- PCT Application Number:
- PCT/US/2003/036223
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP037833993
- PCT Publication Number:
- WO/2004/044963
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- ATOMIC LAYER DEPOSITION METHODS
- French Title of Invention:
- PROCEDES DE DEPOT DE COUCHE ATOMIQUE
- German Title of Invention:
- VERFAHREN ZUR ATOMSCHICHTABSCHEIDUNG
- SPC Number:
Dates
- Filing date:
- 12/11/2003
- Grant date:
- 27/04/2011
- EP Publication Date:
- 27/04/2011
- PCT Publication Date:
- 27/05/2004
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 10/08/2005
- EP B1 Publication Date:
- 27/04/2011
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 12/11/2011
- Expiration date:
- 12/11/2023
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 12/11/2003
- Name:
- Micron Technology Inc.
- Address:
- 8000 South Federal Way, MS 525, Boise, ID 83716, United States (US)
Inventor
1
- Name:
- DOAN Trung, Tri
- Address:
- United States (US)
2
- Name:
- BLALOCK Guy, T.
- Address:
- United States (US)
3
- Name:
- SANDHU Gurtej, S.
- Address:
- United States (US)
Priority
- Priority Number:
- 293072
- Priority Date:
- 12/11/2002
- Priority Country:
- United States (US)
Classification
- Main IPC Class:
- H01L 21/285;
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