Patent details
EP2287893 Title: Exposure apparatus, exposure method and device manufacturing method
Basic Information
- Publication number:
- EP2287893
- PCT Application Number:
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP101861409
- PCT Publication Number:
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- Exposure apparatus, exposure method and device manufacturing method
- French Title of Invention:
- Appareil d'exposition, méthode d'exposition et procédé de fabrication d'un dispositif
- German Title of Invention:
- Beleuchtungseinrichtung, Beleuchtungsverfahren und Vorrichtungsherstellungsverfahren
- SPC Number:
Dates
- Filing date:
- 27/01/2005
- Grant date:
- 20/04/2016
- EP Publication Date:
- 20/04/2016
- PCT Publication Date:
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 23/02/2011
- EP B1 Publication Date:
- 20/04/2016
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 27/01/2017
- Expiration date:
- 27/01/2025
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 27/01/2005
- Name:
- Nikon Corporation
- Address:
- 15-3, Konan 2-chome Minato-ku, Tokyo 108-6290, Japan (JP)
Inventor
- Name:
- Shibazaki Yuichi
- Address:
- Japan (JP)
Priority
1
- Priority Number:
- 2004025837
- Priority Date:
- 02/02/2004
- Priority Country:
- Japan (JP)
2
- Priority Number:
- 2004300566
- Priority Date:
- 14/10/2004
- Priority Country:
- Japan (JP)
Classification
- Main IPC Class:
- H01L 21/027;
Annual Fees
- Annual Fee Due Date:
- Annual Fee Number:
- Expected Payer:
- Last Annual Fee Payment Date:
- Last Annual Fee Paid Number:
- Payer:
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