Patent details
EP2624284 Title: Low energy ion beam etch
Basic Information
- Publication number:
- EP2624284
- PCT Application Number:
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP131531600
- PCT Publication Number:
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- Low energy ion beam etch
- French Title of Invention:
- Gravure par faisceau d'ions de faible énergie
- German Title of Invention:
- Niedrigenergieionenstrahlätzung
- SPC Number:
Dates
- Filing date:
- 30/01/2013
- Grant date:
- 25/05/2016
- EP Publication Date:
- 25/05/2016
- PCT Publication Date:
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 07/08/2013
- EP B1 Publication Date:
- 25/05/2016
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 30/01/2017
- Expiration date:
- 30/01/2033
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 30/01/2013
- Name:
- FEI Company
- Address:
- 5350 NE Dawson Creek Drive, Hillsboro, OR 97124-5793, United States (US)
Inventor
- Name:
- Rue Mr. Chad
- Address:
- United States (US)
Priority
1
- Priority Number:
- 201261593281
- Priority Date:
- 31/01/2012
- Priority Country:
- United States (US)
2
- Priority Number:
- 201213717272
- Priority Date:
- 17/12/2012
- Priority Country:
- United States (US)
Classification
- Main IPC Class:
- H01L 21/311;
Annual Fees
- Annual Fee Due Date:
- Annual Fee Number:
- Expected Payer:
- Last Annual Fee Payment Date:
- Last Annual Fee Paid Number:
- Payer:
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