Patent details
EP2681623 Title: PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
Basic Information
- Publication number:
- EP2681623
- PCT Application Number:
- JP2012055298
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP127529675
- PCT Publication Number:
- WO2012118168
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
- French Title of Invention:
- PROCÉDÉ DE FORMATION DE MOTIF, COMPOSITION DE RÉSINE SENSIBLE À UN RAYON ACTINIQUE OU À UN RAYONNEMENT ET FILM DE RÉSERVE
- German Title of Invention:
- MUSTERBILDUNGSVORRICHTUNG, GEGENÜBER AKTINISCHER STRAHLEN ODER STRAHLUNG EMPFINDLICHE HARZZUSAMMENSETZUNG UND RESISTFILM
- SPC Number:
Dates
- Filing date:
- 24/02/2012
- Grant date:
- 10/07/2019
- EP Publication Date:
- 08/01/2014
- PCT Publication Date:
- 07/09/2012
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 10/07/2019
- EP B1 Publication Date:
- 10/07/2019
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 24/02/2020
- Expiration date:
- 24/02/2032
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 03/07/2019
- Name:
- FUJIFILM Corporation
- Address:
- 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-0031, Japan (JP)
Inventor
1
- Name:
- KATAOKA, Shohei
- Address:
- Japan (JP)
2
- Name:
- YAMAGUCHI, Shuhei
- Address:
- Japan (JP)
3
- Name:
- YOSHINO, Fumihiro
- Address:
- Japan (JP)
4
- Name:
- TAKAHASHI, Hidenori
- Address:
- Japan (JP)
5
- Name:
- SHIRAKAWA, Michihiro
- Address:
- Japan (JP)
6
- Name:
- SAITOH, Shoichi
- Address:
- Japan (JP)
Priority
1
- Priority Number:
- 2011043321
- Priority Date:
- 28/02/2011
- Priority Country:
- Japan (JP)
2
- Priority Number:
- 201161447258 P
- Priority Date:
- 28/02/2011
- Priority Country:
- United States (US)
3
- Priority Number:
- 2011177257
- Priority Date:
- 12/08/2011
- Priority Country:
- Japan (JP)
4
- Priority Number:
- 2012035633
- Priority Date:
- 21/02/2012
- Priority Country:
- Japan (JP)
Classification
- IPC classification:
- G03F 7/004; G03F 7/038; G03F 7/039; G03F 7/11; G03F 7/20; G03F 7/32; G03F 7/40;
Publication
European Patent Bulletin
- Issue number:
- 201928
- Publication date:
- 10/07/2019
- Description:
- Grant (B1)
Annual Fees
- Annual Fee Due Date:
- Annual Fee Number:
- Expected Payer:
- Last Annual Fee Payment Date:
- Last Annual Fee Paid Number:
- Payer:
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