Patent details

Basic Information

Publication number:

EP2699966

PCT Application Number:

EP2012057366

Type:

European Patent Granted for LU

Legal Status:

Lapsed

Application number:

EP127160174

PCT Publication Number:

WO2012143548

First applicant's nationality:

Translation Language:

EPO Publication Language:

English

English Title of Invention:

NETWORK ARCHITECTURE AND PROTOCOL FOR CLUSTER OF LITHOGRAPHY MACHINES

French Title of Invention:

ARCHITECTURE DE RESEAU ET PROTOCOLE POUR UN CLUSTER DES APPAREILS LITHOGRAPHIQUES

German Title of Invention:

NETZWERKARCHITEKTUR UND PROTOKOLL FÜR EINEN CLUSTER VON LITHOGRAFIEGERÄTEN

SPC Number:

Dates

Filing date:

23/04/2012

Grant date:

07/04/2021

EP Publication Date:

26/02/2014

PCT Publication Date:

26/10/2012

Claims Translation Received Date:

Translations Received Date (B1 EP Publication):

Translations Received Date (B2 EP Publication):

Translations Received Date (B3 EP Publication):

Publication date:

07/04/2021

EP B1 Publication Date:

07/04/2021

EP B2 Publication Date:

EP B3 Publication Date:

Lapsed date:

23/04/2021

Expiration date:

23/04/2032

Renunciation date:

Revocation date:

Annulment date:

Owner

From:

31/03/2021

 

 

Name:

ASML Netherlands B.V.

Address:

De Run 6501, 5504 DR Veldhoven, Netherlands (NL)

Inventor

1

Name:

VAN KERVINCK, Marcel Nicolaas Jacobus

Address:

Netherlands (NL)

2

Name:

DE BOER, Guido

Address:

Netherlands (NL)

Priority

1

Priority Number:

201161478117 P

Priority Date:

22/04/2011

Priority Country:

United States (US)

2

Priority Number:

201161533673 P

Priority Date:

12/09/2011

Priority Country:

United States (US)

Classification

IPC classification:

G03F 7/20; H01J 37/317;

Publication

European Patent Bulletin

Issue number:

202114

Publication date:

07/04/2021

Description:

Grant (B1)

Annual Fees

Annual Fee Due Date:

Annual Fee Number:

Expected Payer:

Last Annual Fee Payment Date:

Last Annual Fee Paid Number:

Payer:

Filing date	Document type	Number of pages