Patent details
EP2878699 Title: TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
Basic Information
- Publication number:
- EP2878699
- PCT Application Number:
- JP2013082764
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP138662366
- PCT Publication Number:
- WO2014097897
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
- French Title of Invention:
- CIBLE DE PULVÉRISATION EN TANTALE ET PROCÉDÉ POUR PRODUIRE CELLE-CI
- German Title of Invention:
- TANTALSPUTTERTARGET UND HERSTELLUNGSVERFAHREN DAFÜR
- SPC Number:
Dates
- Filing date:
- 06/12/2013
- Grant date:
- 15/07/2020
- EP Publication Date:
- 03/06/2015
- PCT Publication Date:
- 26/06/2014
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 15/07/2020
- EP B1 Publication Date:
- 15/07/2020
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 06/12/2020
- Expiration date:
- 06/12/2033
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 08/07/2020
- Name:
- JX Nippon Mining & Metals Corp.
- Address:
- 6-3, Otemachi 2-chome, Chiyoda-ku Tokyo 100-8164, Japan (JP)
Inventor
1
- Name:
- SENDA, Shinichiro
- Address:
- Japan (JP)
2
- Name:
- NAGATSU, Kotaro
- Address:
- Japan (JP)
Priority
- Priority Number:
- 2012276883
- Priority Date:
- 19/12/2012
- Priority Country:
- Japan (JP)
Classification
- IPC classification:
- B21B 1/22; C23C 14/14; C23C 14/34; H01L 21/285;
Publication
European Patent Bulletin
- Issue number:
- 202029
- Publication date:
- 15/07/2020
- Description:
- Grant (B1)
Annual Fees
- Annual Fee Due Date:
- Annual Fee Number:
- Expected Payer:
- Last Annual Fee Payment Date:
- Last Annual Fee Paid Number:
- Payer:
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