Patent details
EP2881790 Title: Photomask blank
Basic Information
- Publication number:
- EP2881790
- PCT Application Number:
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP141960088
- PCT Publication Number:
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- Photomask blank
- French Title of Invention:
- Ébauche de photomasque
- German Title of Invention:
- Fotomaskenrohling
- SPC Number:
Dates
- Filing date:
- 03/12/2014
- Grant date:
- 19/06/2019
- EP Publication Date:
- 10/06/2015
- PCT Publication Date:
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 19/06/2019
- EP B1 Publication Date:
- 19/06/2019
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 03/12/2019
- Expiration date:
- 03/12/2034
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 12/06/2019
- Name:
- Shin-Etsu Chemical Co., Ltd.
- Address:
- 6-1, Ohtemachi 2-chome Chiyoda-ku, Tokyo, Japan (JP)
Inventor
1
- Name:
- Kaneko, Hideo
- Address:
- Japan (JP)
2
- Name:
- Inazuki, Yukio
- Address:
- Japan (JP)
3
- Name:
- Nakagawa, Hideo
- Address:
- Japan (JP)
4
- Name:
- Fukaya, Souichi
- Address:
- Japan (JP)
5
- Name:
- Sasamoto, Kouhei
- Address:
- Japan (JP)
Priority
- Priority Number:
- 2013253239
- Priority Date:
- 06/12/2013
- Priority Country:
- Japan (JP)
Classification
Publication
European Patent Bulletin
- Issue number:
- 201925
- Publication date:
- 19/06/2019
- Description:
- Grant (B1)
Annual Fees
- Annual Fee Due Date:
- Annual Fee Number:
- Expected Payer:
- Last Annual Fee Payment Date:
- Last Annual Fee Paid Number:
- Payer:
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