Patent details

Basic Information

Publication number:

EP4075488

PCT Application Number:

Type:

European Patent Granted for LU

Legal Status:

Lapsed

Application number:

EP211679907

PCT Publication Number:

First applicant's nationality:

Translation Language:

EPO Publication Language:

German

English Title of Invention:

METHOD FOR MANUFACTURING SEMICONDUCTOR WAFERS HAVING AN EPITAXIAL LAYER DEPOSITED FROM THE GAS PHASE IN A DEPOSITION CHAMBER

French Title of Invention:

PROCÉDÉ DE FABRICATION DE PLAQUETTES SEMI-CONDUCTRICES À COUCHE ÉPITAXIALE DÉPOSÉE EN PHASE GAZEUSE DANS UNE CHAMBRE DE DÉPÔT

German Title of Invention:

VERFAHREN ZUM HERSTELLEN VON HALBLEITERSCHEIBEN MIT AUS DER GASPHASE ABGESCHIEDENER EPITAKTISCHER SCHICHT IN EINER ABSCHEIDEKAMMER

SPC Number:

Dates

Filing date:

13/04/2021

Grant date:

28/02/2024

EP Publication Date:

19/10/2022

PCT Publication Date:

Claims Translation Received Date:

Translations Received Date (B1 EP Publication):

Translations Received Date (B2 EP Publication):

Translations Received Date (B3 EP Publication):

Publication date:

28/02/2024

EP B1 Publication Date:

28/02/2024

EP B2 Publication Date:

EP B3 Publication Date:

Lapsed date:

13/04/2024

Expiration date:

13/04/2041

Renunciation date:

Revocation date:

Annulment date:

Owner

From:

21/02/2024

 

 

Name:

Siltronic AG

Address:

Einsteinstraße 172 Tower B / Blue Tower, 81677 München, Germany (DE)

Inventor

Name:

Stettner, Thomas

Address:

Germany (DE)

Classification

IPC classification:

H01L 21/68;

Publication

European Patent Bulletin

Issue number:

202409

Publication date:

28/02/2024

Description:

Grant (B1)

Annual Fees

Annual Fee Due Date:

Annual Fee Number:

Expected Payer:

Last Annual Fee Payment Date:

Last Annual Fee Paid Number:

Payer:

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