Patent details
EP1345844 Title: SOI/GLASS PROCESS FOR FORMING THIN SILICON MICROMACHINED STRUCTURES
Basic Information
- Publication number:
- EP1345844
- PCT Application Number:
- PCT/US/2001/050089
- Type:
- European Patent Granted for LU
- Legal Status:
- Lapsed
- Application number:
- EP019933340
- PCT Publication Number:
- WO/2002/057180
- First applicant's nationality:
- Translation Language:
- EPO Publication Language:
- English
- English Title of Invention:
- SOI/GLASS PROCESS FOR FORMING THIN SILICON MICROMACHINED STRUCTURES
- French Title of Invention:
- PROCEDE SOI/VERRE DE FORMATION DE STRUCTURES MINCES DE SILICIUM MICRO-USINEES
- German Title of Invention:
- SOI/GLAS-VERFAHREN ZUR HERSTELLUNG VON DÜNNEN MIKROBEARBEITETEN STRUKTUREN
- SPC Number:
Dates
- Filing date:
- 20/12/2001
- Grant date:
- 04/11/2009
- EP Publication Date:
- 04/11/2009
- PCT Publication Date:
- 25/07/2002
- Claims Translation Received Date:
- Translations Received Date (B1 EP Publication):
- Translations Received Date (B2 EP Publication):
- Translations Received Date (B3 EP Publication):
- Publication date:
- 24/09/2003
- EP B1 Publication Date:
- 04/11/2009
- EP B2 Publication Date:
- EP B3 Publication Date:
- Lapsed date:
- 20/12/2009
- Expiration date:
- 20/12/2021
- Renunciation date:
- Revocation date:
- Annulment date:
Owner
- From:
- 20/12/2001
- Name:
- Honeywell International Inc.
- Address:
- 101 Columbia Road P.O. Box 2245, Morristown NJ 07960, United States (US)
Inventor
1
- Name:
- CABUZ Cleopatra
- Address:
- United States (US)
2
- Name:
- RIDLEY Jeffrey, Alan
- Address:
- United States (US)
Priority
- Priority Number:
- 748488
- Priority Date:
- 27/12/2000
- Priority Country:
- United States (US)
Classification
- Main IPC Class:
- B81C 1/00;
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