Patent details

EP1391491 Title: METHOD OF FORMING THICK SILICA-BASED FILM

Basic Information

Publication number:
EP1391491
PCT Application Number:
PCT/JP/2002/003957
Type:
European Patent Granted for LU
Legal Status:
Lapsed
Application number:
EP027246271
PCT Publication Number:
WO/2002/088267
First applicant's nationality:
Translation Language:
EPO Publication Language:
Not available
English Title of Invention:
METHOD OF FORMING THICK SILICA-BASED FILM
French Title of Invention:
PROCEDE POUR PRODUIRE UN FILM EPAIS A BASE DE SILICE
German Title of Invention:
VERFAHREN ZUR HERSTELLUNG EINES DICKEN FILMS AUF BASIS VON SILICIUMDIOXID
SPC Number:

Dates

Filing date:
19/04/2002
Grant date:
09/04/2008
EP Publication Date:
09/04/2008
PCT Publication Date:
07/11/2002
Claims Translation Received Date:
Translations Received Date (B1 EP Publication):
Translations Received Date (B2 EP Publication):
Translations Received Date (B3 EP Publication):
Publication date:
25/02/2004
EP B1 Publication Date:
09/04/2008
EP B2 Publication Date:
EP B3 Publication Date:
Lapsed date:
19/04/2008
Expiration date:
19/04/2022
Renunciation date:
Revocation date:
Annulment date:

Owner

From:
19/04/2002
 
 

Name:
NISSAN CHEMICAL INDUSTRIES LIMITED
Address:
7-1, Kanda-Nishiki-cho 3-chome, Chiyoda-ku Tokyo 101-0054, Japan (JP)

Inventor

1

Name:
FURUSHO Hitoshi Nissan Chemical Industries, Ltd.
Address:
Japan (JP)

2

Name:
NAKADA Takakazu Nissan Chemical Industries, Ltd.
Address:
Japan (JP)

3

Name:
FUKURO Hiroyoshi Nissan Chemical Industries,Ltd.
Address:
Japan (JP)

4

Name:
MOTOYAMA Kenichi Nissan Chemical Industries,Ltd.
Address:
Japan (JP)

Priority

Priority Number:
2001125339
Priority Date:
24/04/2001
Priority Country:
Japan (JP)

Classification

Main IPC Class:
C09D 183/02;
Filing date Document type Number of pages